CVD Equipment Corp
NASDAQ:CVV
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CVD Equipment Corp
Accumulated Depreciation
CVD Equipment Corp
Accumulated Depreciation Peer Comparison
Competitors Analysis
Latest Figures & CAGR of Competitors
| Company | Accumulated Depreciation | CAGR 3Y | CAGR 5Y | CAGR 10Y | ||
|---|---|---|---|---|---|---|
|
CVD Equipment Corp
NASDAQ:CVV
|
Accumulated Depreciation
N/A
|
CAGR 3-Years
N/A
|
CAGR 5-Years
N/A
|
CAGR 10-Years
N/A
|
|
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KLA Corp
NASDAQ:KLAC
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Accumulated Depreciation
-$1.6B
|
CAGR 3-Years
-15%
|
CAGR 5-Years
-15%
|
CAGR 10-Years
-10%
|
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Applied Materials Inc
NASDAQ:AMAT
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Accumulated Depreciation
-$4B
|
CAGR 3-Years
-5%
|
CAGR 5-Years
-7%
|
CAGR 10-Years
-7%
|
|
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Entegris Inc
NASDAQ:ENTG
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Accumulated Depreciation
-$1.2B
|
CAGR 3-Years
-17%
|
CAGR 5-Years
-16%
|
CAGR 10-Years
-14%
|
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Lam Research Corp
NASDAQ:LRCX
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Accumulated Depreciation
N/A
|
CAGR 3-Years
N/A
|
CAGR 5-Years
N/A
|
CAGR 10-Years
N/A
|
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Teradyne Inc
NASDAQ:TER
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Accumulated Depreciation
-$1B
|
CAGR 3-Years
N/A
|
CAGR 5-Years
N/A
|
CAGR 10-Years
-6%
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CVD Equipment Corp
Glance View
CVD Equipment Corp. engages in the design, development, and manufacture of chemical vapor deposition, gas control, and other state-of-the-art equipment and process solutions. The company is headquartered in Central Islip, New York and currently employs 113 full-time employees. The Company’s segments include CVD/First Nano, SDC, and CVD Materials. The CVD/First Nano supplies chemical vapor deposition systems for use in the research, development and manufacturing of aerospace, medical components, semiconductors, light-emitting devices (LEDs), battery nanomaterial, carbon nanotubes, nanowires, solar cells, and a number of other industrial applications. The SDC segment designs and manufactures ultra-high purity gas and chemical delivery control systems for semiconductor fabrication processes, solar cells, LEDs, carbon nanotubes, and nanowires. The CVD Materials segment includes elements and product groups, such as Tantaline and MesoScribe. Tantaline treatment is a diffusion-bonded protective layer of tantalum formed by chemical vapor deposition on the surface of common materials.